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Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS Featured Image
  • Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS
  • Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS
  • Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS
  • Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS
  • Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS

Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS


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We're going to dedicate ourselves to offering our esteemed shoppers with the most enthusiastically considerate solutions for Handheld Laser Rust Cleaner, Laser Engraving Marking Machine, Focus Lens Co2 Laser, Never-ending improvement and striving for 0% deficiency are our two main quality policies. Should you need anything, don't hesitate to contact us.
Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS Detail:

Product Description

Dynamic scanning optical system optics:1pc small focus lens、1-2pcs focus lens、Galvo mirror.The entire optical lens forms a function of beam expansion, focusing and beam deflection and scanning.
The expanding part is a negative lens, ie small focus lens, which realizes beam expansion and moving zoom, the focusing lens is composed of a group of positive lenses. The galvo mirror is mirror in the galvanometer system.

Product Advantage:

(1) Optimization of lens design: Optimum ratio of diameter to thickness ratio
(2) Lens high damage threshold:>30J/cm2 10ns
(3) Ultra-low absorption coating, absorption rate:<20ppm
(4) Galvanometer thickness to diameter ratio: 1：35
(5) Lens surface accuracy:<= λ/5

Technical Parameters:

Post-Objective Lens

Max Entrance Pupil (mm)

Optics 1 Diameter(mm)

Optics 2 Diameter(mm)

Optics 3 Diameter(mm)

Scan Field

 (mm)

Clear Aperture

of Scanner (mm)

Wavelength

8

15

55

55

600×600

800×800

30

10.6um

12

22

55

55

1600×1600

30

8

16

55

55

600×600

800×800

30

1030-1090nm

8

15

35

35

300×300

10

532nm

8

15

35

35

300×300

10

355nm

Reflector Mirror

Part Description

Diameter(mm)

Thickness(mm)

Material

Coating

Silicon Reflector

25.4

3

Silicon

 HR@10.6um, AOI: 45°

Silicon Reflector

30

4

Silicon

 HR@10.6um, AOI: 45°

Fiber Reflector

25.4

6.35

Fused Silica

 HR@1030-1090nm，AOI: 45°

Fiber Reflector

30

5

Fused Silica

 HR@1030-1090nm，AOI: 45°

Fiber Reflector

50

10

Fused Silica

 HR@1030-1090nm，AOI: 45°

532 Reflector

25.4

6

Fused Silica

 HR@515-540nm/532nm, AOI: 45°

532 Reflector

25.4

6.35

Fused Silica

 HR@515-540nm/532nm, AOI: 45°

532 Reflector

30

5

Fused Silica

 HR@515-540nm/532nm, AOI: 45°

532 Reflector

50

10

Fused Silica

 HR@515-540nm/532nm, AOI: 45°

355 Reflector

25.4

6

Fused Silica

 HR@355nm&433nm, AOI: 45°

355 Reflector

25.4

6.35

Fused Silica

 HR@355nm&433nm, AOI: 45°

355 Reflector

25.4

10

Fused Silica

 HR@355nm&433nm, AOI: 45°

355 Reflector

30

5

Fused Silica

 HR@355nm&433nm, AOI: 45°

Galvo Mirror

Part Description

Max Entrance Pupil (mm)

Material

Coating

Wavelength

55mmL*35mmW*3.5mmT-X

62mmL*43mmW*3.5mmT-Y

30

Silicon

 MMR@10.6um

10.6um

55mmL*35mmW*3.5mmT-X

62mmL*43mmW*3.5mmT-Y

30

Fused Silica

 HR@1030-1090nm

1030-1090nm

55mmL*35mmW*3.5mmT-X

62mmL*43mmW*3.5mmT-Y

30

Fused Silica

 HR@532nm

532nm

55mmL*35mmW*3.5mmT-X

62mmL*43mmW*3.5mmT-Y

30

Fused Silica

 HR@355nm

355nm

Protective Lens

Diameter(mm)

Thickness (mm)

Material

Coating

75

3

ZnSe

AR/AR@10.6um

80

3

ZnSe

AR/AR@10.6um

90

3

ZnSe

AR/AR@10.6um

90×60

5

ZnSe

AR/AR@10.6um

90×64

2.5

ZnSe

AR/AR@10.6um

90×70

3

ZnSe

AR/AR@10.6um

Operational Principle


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Product detail pictures:

Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS detail pictures

Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS detail pictures

Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS detail pictures

Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS detail pictures

Best quality Laser Marking And Engraving - CO2 F-Theta Dynamic Focus post objective scanning system 3D large area laser making system – HAAS detail pictures

Related Product Guide:
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    • The supplier abide the theory of "quality the basic, trust the first and management the advanced" so that they can ensure a reliable product quality and stable customers.
    5 Stars By Agnes from Monaco - 2018.02.21 12:14
    The manufacturer gave us a big discount under the premise of ensuring the quality of products, thank you very much, we will select this company again.
    5 Stars By Patricia from United Arab Emirates - 2018.09.21 11:44

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